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申请号:202010119339.9 公开号:CN111221118A 主分类号:G02B21/36
申请人:【中文】南京理工大学【EN】NANJING UNIVERSITY OF SCIENCE AND TECHNOLOGY 申请日:2020.02.26 公开日:2020.06.02
摘要:【中文】本发明公开了一种基于相位编码单透镜的显微成像方法,只采用一片具有相位编码功能的单透镜进行成像,结合后续处理算法,可实现与现有精密商用显微镜相当的显微成像分辨能力,适用于野外条件下便携地进行生物组织和细胞检测。首先成像系统采用一片具有两个非球面面型的相位编码单透镜对生物样本进行成像,图像传感器位于G光照明下的生物样品的共轭位置,用于图像的采集;然后采用算法对采集到的图像进行处理:分别对采集到的图像在R\B两个通道执行自动聚焦算法,重建恢复出R\B两个通道的准焦图像;对R\G\B三个通道的准焦图像分别采用已经训练好的生成对抗神经网络(GAN)的核函数进行高分辨图像重建;最后将重建后的R\G\B图像进行图像匹配和彩色融合。 【EN】The invention discloses a microscopic imaging method based on a phase coding single lens, which only adopts a single lens with a phase coding function for imaging, combines a subsequent processing algorithm, can realize microscopic imaging resolution capability equivalent to that of the existing precise commercial microscope, and is suitable for carrying out biological tissue and cell detection in a portable way under the field condition. Firstly, an imaging system adopts a phase coding single lens with two aspheric surface shapes to image a biological sample, and an image sensor is positioned at the conjugate position of the biological sample under G light illumination and used for collecting images; then, processing the acquired image by adopting an algorithm: respectively executing an automatic focusing algorithm on the acquired images in the R \ B channels, and reconstructing and recovering quasi-focus images of the R \ B channels; respectively adopting the trained kernel function for generating a antagonistic neural network (GAN) to carry out high-resolution image reconstruction on the quasi-focus images of the three channels R \ G \ B; and finally, carrying out image matching and color fusion on the reconstructed R \ G \ B image.
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申请号:201910892838.9 公开号:CN110970289A 主分类号:H01L21/02
申请人:【中文】三星电子株式会社【EN】Samsung Electronics Co.,Ltd. 申请日:2019.09.20 公开日:2020.04.07
摘要:【中文】提供一种形成石墨烯的方法。形成石墨烯的方法包括:当对放置在反应室中的基板施加偏压时用等离子体处理基板的表面;以及通过等离子体增强化学气相沉积(PECVD)在基板的表面上生长石墨烯。 【EN】A method of forming graphene is provided. The method for forming graphene comprises the following steps: treating a surface of a substrate with plasma while applying a bias voltage to the substrate placed in a reaction chamber; and growing graphene on a surface of the substrate by Plasma Enhanced Chemical Vapor Deposition (PECVD).
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