摘要：【中文】本发明公开了一种带切割道的紫外固化纳米压印模具及方法。包括基板；包括切割道遮光层，切割道遮光层布置于基板上表面；包括微纳结构层，微纳结构层为直接设在基板下表面上的微纳凹凸表面，微纳结构层材料和基板一致；微纳结构层为覆盖在基板下表面的带有微纳凹凸表面的材料层。本发明可使在纳米压印晶圆上，在设计好的切割道区域内没有压印胶残余层直接露出基底材料，这样避免了由于压印胶残余层给后续切割工艺带来的困难，大大提高良率和产品质量，降低切割时间和成本。 【EN】The invention discloses an ultraviolet curing nanoimprint lithography mold with a cutting channel and a method. Comprises a substrate; the device comprises a cutting channel light shielding layer arranged on the upper surface of a substrate; the micro-nano structure layer is a micro-nano concave-convex surface directly arranged on the lower surface of the substrate, and the material of the micro-nano structure layer is consistent with that of the substrate; the micro-nano structure layer is a material layer with a micro-nano concave-convex surface and covers the lower surface of the substrate. The invention can ensure that no imprint adhesive residual layer is directly exposed out of the substrate material in the designed cutting path area on the nano imprint wafer, thereby avoiding the difficulty brought to the subsequent cutting process by the imprint adhesive residual layer, greatly improving the yield and the product quality and reducing the cutting time and the cutting cost.