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申请号:202010201512.X 公开号:CN111254497A 主分类号:C30B33/10
摘要:【中文】本发明公开了一种单晶硅片二次制绒制备多孔金字塔结构用添加剂,其各组分的质量百分含量为:聚苯乙烯磺酸钠0.1%~10%,聚乙二醇2%~20%,氟碳表面活性剂1%~5%,无机盐20%~30%,余量为水。在单晶硅片二次制绒的制绒液中添加本发明的添加剂,能使单晶硅片表面形成多孔金字塔结构。且本发明制备单晶硅片多孔金字塔结构的方法成本更低,工艺更简单。 【EN】The invention discloses an additive for preparing a porous pyramid structure by secondary texturing of a monocrystalline silicon wafer, which comprises the following components in percentage by mass: 0.1-10% of sodium polystyrene sulfonate, 2-20% of polyethylene glycol, 1-5% of fluorocarbon surfactant, 20-30% of inorganic salt and the balance of water. The additive is added into the texturing solution for secondary texturing of the monocrystalline silicon piece, so that a porous pyramid structure can be formed on the surface of the monocrystalline silicon piece. The method for preparing the monocrystalline silicon piece porous pyramid structure is lower in cost and simpler in process.
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