摘要：【中文】本发明提供一种阵列基板及其制备方法、显示装置。该阵列基板的制备方法包括：在基底上形成绝缘挡墙，绝缘挡墙通过从基底的背离形成绝缘挡墙的一侧曝光形成；形成绝缘挡墙之前还包括：形成遮光层的图形。该阵列基板的制备方法，通过从基底的背离形成绝缘挡墙的一侧曝光形成绝缘挡墙，能够避免绝缘挡墙与像素电极边缘产生覆叠，从而使显示开口率不会遭受损失；通过在形成绝缘挡墙之前形成遮光层的图形，能够确保绝缘挡墙的图形通过背面曝光正常形成，从而避免相邻像素之间产生的电场相互干扰所导致的显示串扰现象，提升了阵列基板的品质。 【EN】The invention provides an array substrate, a preparation method thereof and a display device. The preparation method of the array substrate comprises the following steps: forming an insulating retaining wall on the substrate, wherein the insulating retaining wall is formed by exposing one side of the substrate, which is far away from the side where the insulating retaining wall is formed; before forming the insulating retaining wall, the method also comprises the following steps: and forming a pattern of the light shielding layer. According to the preparation method of the array substrate, the insulating retaining wall is formed by exposing from the side, away from the substrate, of the substrate, where the insulating retaining wall is formed, so that the insulating retaining wall and the edge of the pixel electrode can be prevented from being overlapped, and the display aperture ratio is prevented from being lost; the pattern of the light shielding layer is formed before the insulating retaining wall is formed, so that the pattern of the insulating retaining wall can be normally formed through back exposure, the display crosstalk phenomenon caused by mutual interference of electric fields generated between adjacent pixels is avoided, and the quality of the array substrate is improved.