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1:
[发明]
【中文】一种基于人脸识别的跑步智能测试系统及方法 【EN】Intelligent running test system and method based on face recognition
申请号:
201911347816.0
公开号:CN111144275A 主分类号:G06K9/00
申请人:
【中文】中石化第十建设有限公司
;
张万民【EN】SINOPEC TENTH CONSTRUCTION Co.
;
Zhang Wanmin
申请日:2019.12.24 公开日:2020.05.12
发明人:
【中文】张万民
;
董雪玮
;
宋振峰
;
孙会杨
;
周静
;
何连之
;
陈淑芬【EN】Zhang Wanmin
;
Dong Xuewei
;
Song Zhenfeng
;
Sun Huiyang
;
Zhou Jing
;
He Lianzhi
;
Chen Shufen
摘要:【中文】本公开提出了一种基于人脸识别的跑步智能测试系统及方法,包括服务器、监控平台,设置在跑步现场的摄像装置和显示装置,以及设置在起跑线和终点线的标志,所述监控平台包括人脸识别子系统、报名管理子系统和现场测试子系统;报名管理子系统用于获取考生的报名信息构建报名数据库;人脸识别子系统用于根据报名数据库中的数据识别被测试人员的身份信息;现场测试子系统根据获取的跑步视频数据中终点图像和起点图像间隔的图像数据帧,计算获取被测试人员的考试成绩。采用人脸识别,学生跑步跟踪录像、起点线和终点线特殊标志识别等方法,基于学生跑步录像进行学生识别和计时,实现了跑步的智能测试,实现无人监考,并有效防范了作弊行为的发生。 【EN】The intelligent running test system comprises a server, a monitoring platform, a camera device and a display device which are arranged on a running site, and marks arranged on a starting line and a finishing line, wherein the monitoring platform comprises a face recognition subsystem, an enrollment management subsystem and a field test subsystem; the registration management subsystem is used for acquiring registration information of examinees to construct a registration database; the face recognition subsystem is used for recognizing the identity information of the tested person according to the data in the registration database; and the field test subsystem calculates and acquires the examination result of the tested person according to the image data frame of the interval between the end point image and the start point image in the acquired running video data. By adopting the methods of face recognition, student running tracking video recording, start line and finish line special mark recognition and the like, the student identification and timing are carried out based on the student running video recording, the intelligent running test is realized, unmanned invigilation is realized, and cheating behaviors are effectively prevented.
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2:
[发明]
【中文】卡扣结构和壳体 【EN】Buckle structure and casing
申请号:
201911197728.7
公开号:CN110854606A 主分类号:H01R13/502
申请人:
【中文】安徽江淮汽车集团股份有限公司【EN】Anhui Jianghuai Automobile Group Limited by Share Ltd
申请日:2019.11.27 公开日:2020.02.28
发明人:
【中文】吴刚
;
马腾飞
;
敬文博
;
黄瑞欣
;
余学伟
;
董奇奇
;
温敏
;
怀自力
;
陈伟【EN】Wu Gang
;
Ma Tengfei
;
Jing Wen Bo
;
Huang Ruixin
;
Yu Xuewei
;
Dong Qiqi
;
Wen Min
;
Huai Zili
;
Chen Wei
摘要:【中文】本发明公开一种卡扣结构和壳体,其中,卡扣结构包括:定位件,所述定位件设有第一限位板和第二限位板,所述第一限位板和所述第二限位板间隔设置以配合形成限位间隙,所述第一限位板开设有限位孔;和紧固件,所述紧固件包括主体板和设于所述主体板一表面的卡勾;所述主体板和所述卡勾插入所述限位间隙,以使所述主体板相对的两表面分别抵接于所述第一限位板和第二限位板相对的表面,且所述卡勾周向侧壁与所述第一限位板于所述限位孔的内壁抵接,以使所述卡勾限位固定于所述限位孔内。本发明技术方案旨在提高卡扣结构的安装精度,以及提高卡扣结构装配安装的效率。 【EN】The invention discloses a buckle structure and a shell, wherein the buckle structure comprises: the positioning piece is provided with a first limiting plate and a second limiting plate, the first limiting plate and the second limiting plate are arranged at intervals to be matched to form a limiting gap, and the first limiting plate is provided with a limiting hole; the fastener comprises a main body plate and a clamping hook arranged on one surface of the main body plate; the main body plate and the clamping hook are inserted into the limiting gap, so that two opposite surfaces of the main body plate are respectively abutted to the opposite surfaces of the first limiting plate and the second limiting plate, the circumferential side wall of the clamping hook is abutted to the inner wall of the limiting hole of the first limiting plate, and the clamping hook is limited and fixed in the limiting hole. The technical scheme of the invention aims to improve the mounting precision of the buckle structure and improve the assembly and mounting efficiency of the buckle structure.
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3:
[发明]
【中文】一种分布式储能系统二次调频控制方法及系统 【EN】Secondary frequency modulation control method and system for distributed energy storage system
申请号:
202010151834.8
公开号:CN111224433A 主分类号:H02J3/48
申请人:
【中文】中国电力科学研究院有限公司
;
国网新源张家口风光储示范电站有限公司
;
国家电网有限公司【EN】CHINA ELECTRIC POWER RESEARCH INSTITUTE Co.,Ltd.
;
STATE GRID XINYUAN ZHANGJIAKOU SCENERY STORAGE DEMONSTRATION POWER PLANT Co.,Ltd.
;
STATE GRID CORPORATION OF CHINA
申请日:2020.03.06 公开日:2020.06.02
发明人:
【中文】李相俊
;
马锐
;
刘汉民
;
贾学翠
;
田云峰
;
王上行
;
杨水丽
;
马会萌
;
董文琦
;
毛海波
;
史学伟【EN】Li Xiangjun
;
Ma Rui
;
Liu Hanmin
;
Jia Xuecui
;
Tian Yunfeng
;
Wang Shangxing
;
Yang Shuili
;
Ma Huimeng
;
Dong Wenqi
;
Mao Haibo
;
Shi Xuewei
摘要:【中文】本发明公开了一种分布式储能系统二次调频控制方法,所述方法包括:根据电力系统允许频率偏差范围,确定所述电力系统的系统频率状态区间;确定储能系统的状态区间;根据所述系统频率状态区间和所述状态区间,建立强化学习矩阵,确定强化学习学习率;对所述状态区间进行初始化;根据所述强化学习矩阵的更新策略,计算下一时刻所有动作的奖励值,采取奖励值最大的策略对应的选择动作;利用所述选择动作获取所述强化学习矩阵的某一元素的值,更新所述强化学习矩阵;当所述强化学习矩阵满足收敛条件时,将所述强化学习矩阵进行保存;利用所述经过保存的强化学习矩阵,对分布式储能系统二次调频进行控制。 【EN】The invention discloses a distributed energy storage system secondary frequency modulation control method, which comprises the following steps: determining a system frequency state interval of the power system according to the allowable frequency deviation range of the power system; determining a state interval of the energy storage system; establishing a reinforcement learning matrix according to the system frequency state interval and the state interval, and determining a reinforcement learning rate; initializing the state interval; calculating the reward values of all actions at the next moment according to the updating strategy of the reinforcement learning matrix, and adopting the selection action corresponding to the strategy with the maximum reward value; acquiring the value of a certain element of the reinforcement learning matrix by using the selection action, and updating the reinforcement learning matrix; when the reinforcement learning matrix meets the convergence condition, storing the reinforcement learning matrix; and controlling the secondary frequency modulation of the distributed energy storage system by using the stored reinforcement learning matrix.
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4:
[发明]
【中文】一种报废金属管道的处理方法 【EN】Method for treating scrapped metal pipeline
申请号:
201911116693.X
公开号:CN110863206A 主分类号:C23F13/08
申请人:
【中文】中国石油化工股份有限公司
;
中石化炼化工程(集团)股份有限公司【EN】China Petroleum & Chemical Corp.
;
Sinopec Engineering (Group) Co.,Ltd.
申请日:2019.11.15 公开日:2020.03.06
发明人:
【中文】张国良
;
宋纯民
;
刘希武
;
庞平
;
温泉嵩
;
宋业恒
;
董雪琟
;
李昕
;
张继军
;
孙伟
;
瞿帆
;
张亮
;
杨莹
;
刘九林
;
潘吉龙
;
孟繁兴【EN】Zhang Guoliang
;
Song Chunmin
;
Liu Xiwu
;
Pang Ping
;
Wen Quansong
;
Song Yeheng
;
Dong Xuewei
;
Li Xin
;
Zhang Jijun
;
Sun Wei
;
Qu Fan
;
Zhang Liang
;
Yang Ying
;
Liu Jiulin
;
Pan Jilong
;
Meng Fanxing
摘要:【中文】本发明公开了一种报废金属管道的处理方法,涉及报废管道处理技术领域,该处理方法包括将至少一个电源负极连接所述报废金属管道的金属部分,电源正极连接地面,在第一电压的条件下通电,所述第一电压≥1.23V,然后,交换电源正负极,在第二电压的条件下通电。本发明采用管道涂层电解水剥离技术,可以提高管道金属和涂层的缝隙,加大管道金属表面与空气和水的接触面积,有效提高电化学腐蚀速率。 【EN】The invention discloses a method for processing a scrapped metal pipeline, which relates to the technical field of scrapped pipeline processing and comprises the steps of connecting at least one power supply cathode with a metal part of the scrapped metal pipeline, connecting a power supply anode with the ground, electrifying under the condition of a first voltage, wherein the first voltage is more than or equal to 1.23V, then exchanging the anode and the cathode of the power supply, and electrifying under the condition of a second voltage. The invention adopts the pipeline coating electrolytic water stripping technology, can improve the gap between the pipeline metal and the coating, increases the contact area between the pipeline metal surface and air and water, and effectively improves the electrochemical corrosion rate.
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5:
[发明]
【中文】PVD溅射设备的晶圆按指定路径回盘的控制方法及系统 【EN】Control method and system for returning wafer of PVD sputtering equipment to disc according to specified path
申请号:
201911174232.8
公开号:CN110938807A 主分类号:C23C14/54
申请人:
【中文】北京北方华创微电子装备有限公司【EN】BEIJING NAURA MICROELECTRONICS EQUIPMENT Co.,Ltd.
申请日:2019.11.26 公开日:2020.03.31
发明人:
【中文】陈玉静
;
杨洋
;
董博宇
;
郭冰亮
;
武学伟
;
马迎功
;
赵晨光
;
武树波
;
杨依龙
;
李新颖
;
李丽
;
宋玲彦
;
张璐
;
刘玉杰
;
张家昊【EN】Chen Yujing
;
Yang Yang
;
Dong Boyu
;
Guo Bingliang
;
Wu Xuewei
;
Ma Yinggong
;
Zhao Chenguang
;
Wu Shubo
;
Yang Yilong
;
Li Xinying
;
Li Li
;
Song Lingyan
;
Zhang Lu
;
Liu Yujie
;
Zhang Jiahao
摘要:【中文】本发明公开了一种PVD溅射设备的晶圆按指定路径回盘的控制方法和系统,其中控制方法包括以下步骤:选择源腔室和目的腔室,并选择源腔室的托盘位置和目的腔室的托盘位置;选择工艺配方,工艺配方包括目标晶圆从源腔室传输至目的腔室将要执行的工艺参数;确认开始传盘后,生成并执行第一个子任务,同时监控第一个子任务的状态;当第一个子任务结束时,生成并执行第二个子任务,直至第N个子任务结束,N为自然数,完成目标晶圆从源腔室到目的腔室的回盘操作。本发明的有益效果在于,将在工艺腔室中加工的晶圆从工艺腔室传送到冷却腔室再到装卸载腔室的传输过程,只需一键操作,减轻了操作人员的工作任务,提高了任务的执行效率。 【EN】The invention discloses a control method and a system for returning a wafer of PVD sputtering equipment to a disk according to a specified path, wherein the control method comprises the following steps: selecting a source chamber and a target chamber, and selecting a tray position of the source chamber and a tray position of the target chamber; selecting a process recipe, wherein the process recipe comprises process parameters to be executed when a target wafer is transmitted from a source chamber to a target chamber; after the disk transmission is confirmed to be started, generating and executing a first subtask, and monitoring the state of the first subtask; and when the first subtask is finished, generating and executing a second subtask until the Nth subtask is finished, wherein N is a natural number, and completing the disc returning operation of the target wafer from the source chamber to the target chamber. The invention has the advantages that the wafer processed in the process chamber is transferred from the process chamber to the cooling chamber and then to the loading and unloading chamber, only one key is needed for operation, the work task of an operator is reduced, and the execution efficiency of the task is improved.
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6:
[发明]
【中文】冷却装置及其控制方法、半导体加工设备 【EN】Cooling device, control method thereof and semiconductor processing equipment
申请号:
201911251679.0
公开号:CN110911320A 主分类号:H01L21/67
申请人:
【中文】北京北方华创微电子装备有限公司【EN】BEIJING NAURA MICROELECTRONICS EQUIPMENT Co.,Ltd.
申请日:2019.12.09 公开日:2020.03.24
发明人:
【中文】赵晨光
;
董博宇
;
郭冰亮
;
武学伟
;
马迎功
;
武树波
;
杨依龙
;
李新颖
;
李丽
;
宋玲彦
;
张璐
;
陈玉静
;
刘玉杰
;
张家昊【EN】Zhao Chenguang
;
Dong Boyu
;
Guo Bingliang
;
Wu Xuewei
;
Ma Yinggong
;
Wu Shubo
;
Yang Yilong
;
Li Xinying
;
Li Li
;
Song Lingyan
;
Zhang Lu
;
Chen Yujing
;
Liu Yujie
;
Zhang Jiahao
摘要:【中文】本申请实施例提供了一种冷却装置及其控制方法、半导体加工设备。冷却装置用于对托盘进行冷却,其包括腔室以及设置于腔室内的驱动单元、冷却单元及加热单元;所述驱动单元用于驱动所述托盘移动,以带动所述托盘选择性位于第一位置或第二位置;所述冷却单元用于对所述托盘进行冷却,当所述托盘位于第一位置时以第一速率对所述托盘降温,当所述托盘位于第二位置时以第二速率对所述托盘降温,且所述第二速率大于所述第一速率;所述加热单元用于选择性对所述托盘进行加热,以调整所述冷却单元对所述托盘冷却的速率。本申请实施例实现了稳定托盘的冷却速度,从而可以有效提高冷却效率,进而使得托盘的冷却不再成为影响产能的瓶颈。 【EN】The embodiment of the application provides a cooling device, a control method thereof and semiconductor processing equipment. The cooling device is used for cooling the tray and comprises a cavity, and a driving unit, a cooling unit and a heating unit which are arranged in the cavity; the driving unit is used for driving the tray to move so as to drive the tray to be selectively positioned at a first position or a second position; the cooling unit is used for cooling the tray, when the tray is located at a first position, the tray is cooled at a first speed, when the tray is located at a second position, the tray is cooled at a second speed, and the second speed is greater than the first speed; the heating unit is used for selectively heating the tray so as to adjust the cooling rate of the tray by the cooling unit. The embodiment of the application realizes the cooling speed of the stable tray, thereby effectively improving the cooling efficiency and further ensuring that the cooling of the tray does not become the bottleneck influencing the productivity any more.
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7:
[发明]
【中文】薄膜制备方法 【EN】Film preparation method
申请号:
202010047837.7
公开号:CN111235537A 主分类号:C23C14/35
申请人:
【中文】北京北方华创微电子装备有限公司【EN】BEIJING NAURA MICROELECTRONICS EQUIPMENT Co.,Ltd.
申请日:2020.01.16 公开日:2020.06.05
发明人:
【中文】杨健
;
郭冰亮
;
董博宇
;
宋玲彦
;
孙鲁阳
;
颜晓威
;
马迎功
;
赵晨光
;
武学伟
;
武树波
;
杨依龙
;
李新颖
;
张璐
;
刘玉杰【EN】Yang Jian
;
Guo Bingliang
;
Dong Boyu
;
Song Lingyan
;
Sun Luyang
;
Yan Xiaowei
;
Ma Yinggong
;
Zhao Chenguang
;
Wu Xuewei
;
Wu Shubo
;
Yang Yilong
;
Li Xinying
;
Zhang Lu
;
Liu Yujie
摘要:【中文】本发明提供一种薄膜制备方法,其包括:第一沉积步,向工艺腔室中通入工艺气体,并向靶材加载射频功率,以在衬底上沉积薄膜阻挡层,其中,第一沉积步包括至少两个阻挡层沉积时段,每一阻挡层沉积时段采用的射频功率均大于上一阻挡层沉积时段采用的射频功率;第二沉积步,继续向工艺腔室中通入所述工艺气体,并向靶材加载直流功率,以在薄膜阻挡层上沉积薄膜主体层,其中,第二沉积步包括至少两个主体层沉积时段,每一主体层沉积时段采用的直流功率均大于上一主体层沉积时段采用的直流功率。本发明提供的薄膜制备方法,其可以在减少对底部衬底材料或者阻挡层造成的损伤的基础上,提高产能。 【EN】The invention provides a film preparation method, which comprises the following steps: the method comprises a first deposition step, a second deposition step and a third deposition step, wherein the first deposition step comprises at least two barrier layer deposition periods, and the radio frequency power adopted in each barrier layer deposition period is larger than that adopted in the previous barrier layer deposition period; and a second deposition step of continuously introducing the process gas into the process chamber and loading direct current power to the target to deposit the film main body layer on the film barrier layer, wherein the second deposition step comprises at least two main body layer deposition time periods, and the direct current power adopted in each main body layer deposition time period is greater than that adopted in the last main body layer deposition time period. The film preparation method provided by the invention can improve the productivity on the basis of reducing the damage to the bottom substrate material or the barrier layer.
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8:
[发明]
【中文】承载装置及半导体加工设备 【EN】Bearing device and semiconductor processing equipment
申请号:
201911347255.4
公开号:CN111128847A 主分类号:H01L21/687
申请人:
【中文】北京北方华创微电子装备有限公司【EN】BEIJING NAURA MICROELECTRONICS EQUIPMENT Co.,Ltd.
申请日:2019.12.24 公开日:2020.05.08
发明人:
【中文】张家昊
;
刘玉杰
;
李新颖
;
武学伟
;
董博宇
;
文莉辉
;
武树波
;
杨依龙
;
郭冰亮
;
宋玲彦
;
赵晨光
;
马迎功
;
杨建
;
陈玉静
;
张璐【EN】Zhang Jiahao
;
Liu Yujie
;
Li Xinying
;
Wu Xuewei
;
Dong Boyu
;
Wen Lihui
;
Wu Shubo
;
Yang Yilong
;
Guo Bingliang
;
Song Lingyan
;
Zhao Chenguang
;
Ma Yinggong
;
Yang Jian
;
Chen Yujing
;
Zhang Lu
摘要:【中文】本申请实施例提供了一种承载装置及半导体加工设备。该承载装置设置于工艺腔室内,包括:基座及多个支撑组件;多个支撑组件均设置于基座上,且多个支撑组件相互配合以支撑托盘;支撑组件包括检测部,用于检测支撑组件上受到的压力值。本申请实施例实现了通过支撑组件可以直接对托盘进行检测,可以使得承载装置实现了能够及时发现托盘异常情况,对于无盘、倾斜及碎盘现象均可以通过支撑组件进行检测,从而可以避免承载装置上的托盘发生异常情况。 【EN】The embodiment of the application provides a bearing device and semiconductor processing equipment. This bear device sets up in the technology cavity, includes: a base and a plurality of support components; the plurality of supporting components are arranged on the base and are matched with each other to support the tray; the supporting component comprises a detection part used for detecting the pressure value applied to the supporting component. The embodiment of the application realizes that the tray can be directly detected through the supporting component, the abnormal condition of the tray can be timely found through the bearing device, the tray-free, inclined and broken tray phenomena can be detected through the supporting component, and therefore the abnormal condition of the tray on the bearing device can be avoided.
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9:
[发明]
【中文】基于DCS控制系统的氯气干燥过程中稀硫酸浓度在线控制装置 【EN】DCS control system-based online control device for concentration of dilute sulfuric acid in chlorine drying process
申请号:
202010260658.1
公开号:CN111240373A 主分类号:G05D11/13
申请人:
【中文】唐山三友氯碱有限责任公司【EN】TANGSHAN SANYOU CHLOR-ALKALI Co.,Ltd.
申请日:2020.04.03 公开日:2020.06.05
发明人:
【中文】李学伟
;
严旭
;
郑彩彩
;
贺志宽
;
王磊
;
侯凤银
;
杨小军
;
王佳伟
;
黄玉宾
;
董意明
;
郑学平
;
田树悦
;
郑瑞林
;
王路广
;
李凌云
;
张珲桓
;
曾明星
;
张浩浩
;
陈秀超
;
孟维庆
;
赵洪娣
;
武立广【EN】Li Xuewei
;
Yan Xu
;
Zheng Caicai
;
He Zhikuan
;
Wang Lei
;
Hou Fengyin
;
Yang Xiaojun
;
Wang Jiawei
;
Huang Yubin
;
Dong Yiming
;
Zheng Xueping
;
Tian Shuyue
;
Zheng Ruilin
;
Wang Luguang
摘要:【中文】本发明涉及一种基于DCS控制系统的氯气干燥过程中稀硫酸浓度在线控制装置。包括浓硫酸高位槽、填料干燥塔、泡罩干燥塔、稀硫酸循环泵、稀硫酸冷却器,浓硫酸高位槽的下酸管路上设有下酸控制阀和下酸流量计,填料干燥塔设有液位传感器,外排稀硫酸管道上设有硫酸密度计和排酸调节阀;排酸调节阀与液位传感器电连接,硫酸密度计与高位槽下酸控制阀、下酸流量计电连接,硫酸密度计、排酸调节阀、高位槽下酸控制阀、下酸流量计与DCS控制系统组成控制回路。本发明基于DCS控制系统,通过一定的逻辑关系,将在线密度与流量组成控制回路,精细化控制的同时,减少浓硫酸消耗,减少人工做样频次,节能降耗并有效降低安全环保风险。 【EN】The invention relates to a DCS control system-based online control device for the concentration of dilute sulfuric acid in a chlorine drying process. The device comprises a concentrated sulfuric acid head tank, a filler drying tower, a bubble cap drying tower, a dilute sulfuric acid circulating pump and a dilute sulfuric acid cooler, wherein a lower acid control valve and a lower acid flowmeter are arranged on a lower acid pipeline of the concentrated sulfuric acid head tank, the filler drying tower is provided with a liquid level sensor, and a sulfuric acid densimeter and an acid discharge regulating valve are arranged on an outer discharge dilute sulfuric acid pipeline; the acid discharge regulating valve is electrically connected with the liquid level sensor, the sulfuric acid densimeter is electrically connected with the lower acid control valve of the head tank and the lower acid flow meter, and the sulfuric acid densimeter, the acid discharge regulating valve, the lower acid control valve of the head tank, the lower acid flow meter and the DCS control system form a control loop. Based on a DCS control system, the online density and the flow rate form a control loop through a certain logic relation, so that the concentrated sulfuric acid consumption is reduced while the fine control is realized, the manual sampling frequency is reduced, the energy is saved, the consumption is reduced, and the safety and environmental protection risks are effectively reduced.
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10:
[发明]
【中文】应用于薄膜沉积装置的托盘 【EN】Tray applied to thin film deposition device
申请号:
201911292324.6
公开号:CN111128845A 主分类号:H01L21/687
申请人:
【中文】北京北方华创微电子装备有限公司【EN】BEIJING NAURA MICROELECTRONICS EQUIPMENT Co.,Ltd.
申请日:2019.12.16 公开日:2020.05.08
发明人:
【中文】马迎功
;
董博宇
;
郭冰亮
;
武学伟
;
武树波
;
赵晨光
;
翟洪涛
;
杨依龙
;
杨健
;
甄梓杨
;
宋玲彦
;
孙鲁阳
;
李新颖
;
刘玉杰
;
许文学
;
张璐
;
崔亚欣【EN】Ma Yinggong
;
Dong Boyu
;
Guo Bingliang
;
Wu Xuewei
;
Wu Shubo
;
Zhao Chenguang
;
Zhai Hongtao
;
Yang Yilong
;
Yang Jian
;
Zhen Ziyang
;
Song Lingyan
;
Sun Luyang
;
Li Xinying
;
Liu Yujie
;
Xu Wenxue
;
Zhang Lu
;
C
摘要:【中文】一种应用于薄膜沉积装置的托盘,包括:第一盘体、第二盘体以及连接组件。第一盘体包括用于承载晶圆的多个通孔,且第一盘体下表面设置有多个第一槽位。第二盘体的尺寸与第一盘体的尺寸相对应,且第二盘体上表面设置有多个第二槽位。第二槽位的形状及位置与第一槽位的形状及位置相对应。连接组件位于一一对应的第一槽位及第二槽位之间,用于实现第一盘体和第二盘体的固定连接。第一盘体采用第一材质制备,第二盘体采用第二材质制备,且第一材质的热膨胀系数与待沉积薄膜的热膨胀系数的相对偏差值小于20%,以减少对所述晶圆沉积薄膜时的应力影响;第一材质的体积电阻率大于第二材质的体积电阻率,以使在对晶圆沉积薄膜时第一盘体形成绝缘体。 【EN】A tray for use in a thin film deposition apparatus, comprising: first disk, second disk and coupling assembling. The first disc body comprises a plurality of through holes for bearing wafers, and a plurality of first groove positions are arranged on the lower surface of the first disc body. The size of the second tray body corresponds to that of the first tray body, and a plurality of second groove positions are arranged on the upper surface of the second tray body. The shape and position of the second slot position correspond to the shape and position of the first slot position. The connecting assembly is located between the first slot position and the second slot position which are in one-to-one correspondence, and is used for fixedly connecting the first tray body and the second tray body. The first tray body is made of a first material, the second tray body is made of a second material, and the relative deviation value of the thermal expansion coefficient of the first material and the thermal expansion coefficient of the film to be deposited is less than 20% so as to reduce the stress influence on the wafer during film deposition; the volume resistivity of the first material is greater than the volume resistivity of the second material so that the first disk forms an insulator when the thin film is deposited on the wafer.
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