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Jian Zhixian
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1:
[发明]
【中文】用于TiN-SiN化学机械抛光应用的高选择性的氮化物抑制剂 【EN】High selectivity nitride inhibitors for TiN-SiN CMP applications
申请号:
201880059982.8
公开号:CN111108161A 主分类号:C09G1/02
申请人:
【中文】嘉柏微电子材料股份公司【EN】Cabot Microelectronics Corp.
申请日:2018.08.13 公开日:2020.05.05
发明人:
【中文】简智贤
;
邱逸闳
;
黄宏聪
;
叶铭智【EN】
Jian Zhixian
;
Qiu Yihong
;
Huang Hongcong
;
Ye Mingzhi
摘要:【中文】本发明提供化学机械抛光组合物,包含:(a)研磨剂颗粒;(b)移除速率抑制剂,其选自(I)包含聚氧化烯官能团及磺酸根官能团的表面活性剂、(II)包含聚氧化烯官能团及硫酸根官能团的表面活性剂、(III)包含聚氧化烯官能团的第一表面活性剂及包含磺酸根官能团的第二表面活性剂、及(IV)包含聚氧化烯官能团的第一表面活性剂及包含硫酸根官能团的第二表面活性剂;及(c)水性载剂。本发明还提供利用本发明化学机械抛光组合物对包含TiN及SiN的基板进行化学机械抛光的方法。 【EN】The invention provides a chemical mechanical polishing composition comprising: (a) abrasive particles; (b) a removal rate inhibitor selected from the group consisting of (I) a surfactant comprising a polyoxyalkylene functional group and a sulfonate functional group, (II) a surfactant comprising a polyoxyalkylene functional group and a sulfate functional group, (III) a first surfactant comprising a polyoxyalkylene functional group and a second surfactant comprising a sulfonate functional group, and (IV) a first surfactant comprising a polyoxyalkylene functional group and a second surfactant comprising a sulfate functional group; and (c) an aqueous carrier. The invention also provides a method of chemically-mechanically polishing a substrate comprising TiN and SiN using the inventive chemical-mechanical polishing composition.
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2:
[发明]
【中文】移位寄存器及其驱动方法、栅极驱动电路及显示装置 【EN】Shift register and driving method thereof, grid driving circuit and display device
申请号:
201911304541.2
公开号:CN110910850A 主分类号:G09G3/36
申请人:
【中文】京东方科技集团股份有限公司
;
武汉京东方光电科技有限公司【EN】BOE TECHNOLOGY GROUP Co.,Ltd.
;
Wuhan Jingdong Photoelectric Technology Co.,Ltd.
申请日:2019.12.17 公开日:2020.03.24
发明人:
【中文】刘子正
;
袁东旭
;
赵剑
;
毛大龙
;
陈鹏
;
王志贤
;
高翔宇【EN】Liu Zizheng
;
Yuan Dongxu
;
Zhao Jian
;
Mao Dalong
;
Chen Peng
;
Wang Zhixian
;
Gao Xiangyu
摘要:【中文】一种移位寄存器,包括:输入子电路、输出子电路、第一下拉子电路、第一上拉子电路、第二上拉子电路和第二下拉子电路;输入子电路向上拉节点提供信号输入端的信号;输出子电路在上拉节点的控制下,向信号输出端提供第一时钟信号输入端的信号;第一下拉子电路在复位信号端、第二时钟信号输入端和下拉节点的控制下,向上拉节点和信号输出端提供第一电源端的信号;第一上拉子电路在第二时钟信号输入端和第三节点的控制下,向下拉节点提供第二时钟信号输入端的信号;第二上拉子电路在复位信号端和第四节点的控制下,向下拉节点提供第二电源端的信号;第二下拉子电路在信号输入端的控制下,向第四节点提供第一电源端的信号。 【EN】A shift register, comprising: the circuit comprises an input sub-circuit, an output sub-circuit, a first pull-down sub-circuit, a first pull-up sub-circuit, a second pull-up sub-circuit and a second pull-down sub-circuit; the input sub-circuit provides a signal of the signal input end to the pull-up node; the output sub-circuit provides a signal of the first clock signal input end to the signal output end under the control of the pull-up node; the first pull-down sub-circuit provides signals of a first power supply end to the pull-up node and the signal output end under the control of the reset signal end, the second clock signal input end and the pull-down node; the first pull-up sub-circuit provides a signal of the second clock signal input end to a pull-down node under the control of the second clock signal input end and a third node; the second pull-up sub-circuit provides a signal of a second power supply end to the pull-down node under the control of the reset signal end and the fourth node; the second pull-down sub-circuit provides the signal of the first power supply terminal to the fourth node under the control of the signal input terminal.
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3:
[发明]
【中文】用于钨磨光应用的经表面处理的研磨剂颗粒 【EN】Surface treated abrasive particles for tungsten buffing applications
申请号:
201880064240.4
公开号:CN111183195A 主分类号:C09G1/02
申请人:
【中文】嘉柏微电子材料股份公司【EN】Cabot Microelectronics Corp.
申请日:2018.10.03 公开日:2020.05.19
发明人:
【中文】崔骥
;
黄禾琳
;
K.P.多克里
;
P.K.辛格
;
黄宏聪
;
简智贤【EN】Cui Ji
;
Huang Helin
;
K.P. Dokry
;
P.K. Singh
;
Huang Hongcong
;
Jian Zhixian
摘要:【中文】本发明提供化学机械抛光组合物,其包含(a)研磨剂,选自:氧化铝、氧化铈、氧化钛、氧化锆及其组合,其中该研磨剂表面包覆有包含磺酸单体单元及羧酸单体单元的组合、磺酸单体单元及膦酸单体单元的组合的共聚物,(b)氧化剂,及(c)水,其中该抛光组合物具有约2至约5的pH。本发明进一步提供利用本发明化学机械抛光组合物化学机械抛光基板的方法。典型地,该基板包含钨或钴以及硅氧化物。 【EN】The invention provides a chemical-mechanical polishing composition comprising (a) an abrasive selected from the group consisting of: alumina, ceria, titania, zirconia, and combinations thereof, wherein the abrasive surface is coated with a copolymer comprising a combination of sulfonic acid monomer units and carboxylic acid monomer units, a combination of sulfonic acid monomer units and phosphonic acid monomer units, (b) an oxidizing agent, and (c) water, wherein the polishing composition has a pH of about 2 to about 5. The invention further provides a method of chemically-mechanically polishing a substrate with the chemical-mechanical polishing composition of the invention. Typically, the substrate comprises tungsten or cobalt and silicon oxide.
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4:
[发明]
【中文】一种激光加工系统及激光加工方法 【EN】Laser processing system and laser processing method
申请号:
201811014722.7
公开号:CN110919168A 主分类号:B23K26/00
申请人:
【中文】大族激光科技产业集团股份有限公司【EN】HAN'S LASER TECHNOLOGY INDUSTRY GROUP Co.,Ltd.
申请日:2018.08.31 公开日:2020.03.27
发明人:
【中文】陈治贤
;
庄昌辉
;
冯玙璠
;
黄显东
;
潘凯
;
胡凯歌
;
温喜章
;
戴剑
;
尹建刚
;
高云峰【EN】Chen Zhixian
;
Zhuang Changhui
;
Feng Yufan
;
Huang Xiandong
;
Pan Kai
;
Hu Kaige
;
Wen Xizhang
;
Dai Jian
;
Yin Jiangang
;
Gao Yunfeng
摘要:【中文】本发明公开了一种激光加工系统,包括激光器、光闸组件及控制器;所述激光器用以发射激光束,所述激光束作用于被加工件,以进行激光加工;所述光闸组件在所述激光束光路上设置,包括挡光部,所述挡光部可转动设置,用以通行或阻断所述激光束;所述控制器控制所述挡光部转动,以控制所述激光束的通行或阻断时间,以使所述激光束间隔地作用于所述被加工件。所述光闸组件中的挡光部可转动设置,用以通行或阻断所述激光器发射的激光束,所述激光束可选择性地进行激光加工,提高了加工效率。其中,所述挡光部通行或阻断所述激光束时间由所述控制器控制所述挡光部转动而实现,实现激光加工自动化、精准化。同时,本发明也公开了一种激光加工方法。 【EN】The invention discloses a laser processing system, which comprises a laser, an optical gate assembly and a controller, wherein the optical gate assembly comprises a laser body and a laser beam source; the laser is used for emitting laser beams, and the laser beams act on a processed piece to carry out laser processing; the optical shutter assembly is arranged on the laser beam light path and comprises a light blocking part, and the light blocking part can be arranged in a rotating mode and is used for passing or blocking the laser beam; the controller controls the light blocking part to rotate so as to control the passing or blocking time of the laser beam, so that the laser beam acts on the processed workpiece at intervals. The light blocking part in the optical shutter assembly is rotatably arranged and used for passing or blocking the laser beam emitted by the laser, and the laser beam can be selectively subjected to laser processing, so that the processing efficiency is improved. The controller controls the light blocking part to rotate to realize the passing or blocking of the laser beam time of the light blocking part, and the automation and the precision of laser processing are realized. Meanwhile, the invention also discloses a laser processing method.
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