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[发明]
【中文】新型盐化合物、化学增幅抗蚀剂组合物、及图案形成方法 【EN】Novel salt compound, chemically amplified resist composition, and pattern forming method
申请号:
201911101447.7
公开号:CN111187235A 主分类号:C07D307/00
申请人:
【中文】信越化学工业株式会社【EN】SHIN-ETSU CHEMICAL Co.,Ltd.
申请日:2019.11.12 公开日:2020.05.22
发明人:
【中文】小野绘实子
;
提箸正义
;
福岛将大
;
计良祐纪【EN】
Ono Hiroko
;
Just mentioning chopsticks
;
Fukuzumi Masahiro
;
Quai Yu Yu
摘要:【中文】本发明涉及新型盐化合物、化学增幅抗蚀剂组合物、及图案形成方法。本发明的课题是提供一种化学增幅抗蚀剂组合物,其在以KrF准分子激光、ArF准分子激光、电子束、极紫外线等高能量射线作为光源的光刻中,缺陷少,感度、LWR、MEF、CDU等优异;并提供使用该化学增幅抗蚀剂组合物的图案形成方法。一种盐化合物,其由下式(A)表示。
【EN】The present invention relates to a novel salt compound, a chemically amplified resist composition, and a pattern forming method. The invention provides a chemically amplified resist composition which has few defects and excellent sensitivity, LWR, MEF, CDU and the like in photolithography using high-energy rays such as KrF excimer laser, ArF excimer laser, electron beam, extreme ultraviolet ray and the like as light sources; and a pattern forming method using the chemically amplified resist composition. A salt compound represented by the following formula (A).
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2:
[发明]
【中文】聚合物的制造方法、及聚合物 【EN】Method for producing polymer, and polymer
申请号:
201911040009.4
公开号:CN111138586A 主分类号:C08F220/18
申请人:
【中文】信越化学工业株式会社【EN】SHIN-ETSU CHEMICAL Co.,Ltd.
申请日:2019.10.29 公开日:2020.05.12
发明人:
【中文】阿达铁平
;
提箸正义
;
小野绘实子
;
小野塚英之【EN】Abe Tatsuhei
;
Just mentioning chopsticks
;
Ono Hiroko
;
Onozuka Hideyuki
摘要:【中文】本发明的课题是提供残存单体量少,使用于抗蚀剂组合物时,尤其会展现良好的LWR的聚合物的制造方法。一种聚合物的制造方法,是制造含有来自包含因曝光而分解并产生酸的结构的单体(A)的重复单元、来自具有酸不稳定基团的单体(B)的重复单元、及来自具有酚性羟基的单体(C)的重复单元,且聚合物中所含的单体(A)的残存量为1.0质量%以下的聚合物的制造方法,包含将含有单体(A)、单体(B)、及单体(C)的单体溶液供给到反应釜中的步骤、及在该反应釜内实施聚合反应的步骤,该反应釜内的单体溶液中的单体浓度为35质量%以上,且该单体溶液的溶剂(S)包含选自下式(S‑1)及下式(S‑2)所示的溶剂中的至少1种。
【EN】The invention provides a method for producing a polymer which has a small residual monomer content and exhibits particularly good LWR when used in a resist composition. A process for producing a polymer which comprises a monomer unit derived from a monomer including a monomer having a carboxyl group and a carboxyl group, which is decomposed by exposure to light to produceA method for producing a polymer in which the residual amount of a monomer (A) contained in the polymer is 1.0 mass% or less, the method comprising the step of supplying a monomer solution containing the monomer (A), the monomer (B), and the monomer (C) to a reaction vessel, and the step of carrying out a polymerization reaction in the reaction vessel, wherein the monomer concentration in the monomer solution in the reaction vessel is 35 mass% or more, and the solvent (S) of the monomer solution contains at least 1 selected from the group consisting of solvents represented by the following formulae (S-1) and (S-2).
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3:
[发明]
【中文】片状面膜 【EN】Sheet-like mask
申请号:
201880051169.6
公开号:CN110996717A 主分类号:A45D44/22
申请人:
【中文】日本电信电话株式会社【EN】NIPPON TELEGRAPH AND TELEPHONE Corp.
申请日:2018.05.17 公开日:2020.04.10
发明人:
【中文】小松武志
;
野原正也
;
林政彦
;
小野阳子
;
阪本周平
;
涡卷裕也
;
岩田三佳誉【EN】Komatsu Takeshi
;
Nohara Masaya
;
Lin Zhengyan
;
Ono Hiroko
;
Sakamoto Shuhei
;
Scroll surplus also
;
Iwata Miyoshi
摘要:【中文】片状面膜(1)具备多个电池部(2),配置所述电池部(2)以使电流沿着面部肌肉或淋巴流来流动。由此,能够使有效成分更有效地渗透至体内组织的内部的同时,对于面部肌肉、淋巴管施加电刺激。如果由环境负荷低的材料来构成电池部(2),则能够在日常生活中容易一次性使用。 【EN】The sheet-like mask (1) is provided with a plurality of cell sections (2), and the cell sections (2) are arranged so that an electric current flows along facial muscles or a lymphatic flow. This allows the effective ingredient to more effectively permeate into the internal tissues of the body, and allows electrical stimulation to be applied to the facial muscles and lymphatic vessels. If the battery unit (2) is made of a material with a low environmental load, it can be easily used once in daily life.
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