摘要：【中文】一种光刻设备包括：衬底台、曝光后处理模块、衬底处理机器人及干燥站。所述衬底台被配置成支撑衬底用于曝光过程。所述曝光后处理模块是用于在曝光后处理所述衬底。所述衬底处理机器人被配置成将所述衬底从所述衬底台沿着衬底卸载路径转移至所述曝光后处理模块中。所述干燥站被配置成从所述衬底的表面主动地移除液体。所述干燥站定位于所述衬底卸载路径中。所述干燥站定位于所述曝光后处理模组中。所述曝光后处理模块可以是晶片处理器。 【EN】A lithographic apparatus comprising: a substrate table, a post-exposure processing module, a substrate processing robot, and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure processing module is used for processing the substrate after exposure. The substrate handling robot is configured to transfer the substrate from the substrate table into the post-exposure handling module along a substrate unloading path. The drying station is configured to actively remove liquid from the surface of the substrate. The drying station is positioned in the substrate unloading path. The drying station is positioned in the post-exposure treatment module. The post-exposure processing module may be a wafer handler.