摘要：【中文】本发明的等离子体处理装置包括：感应腔体，用于向内部导入源气体以产生等离子体；处理腔，放置利用感应腔体产生的等离子体进行处理的被处理基板；ICP天线，位于感应腔体外部，形成感应磁场，以便由导入到感应腔体内部的源气体产生等离子体；及高频振荡器，向ICP天线施加射频功率；ICP天线包括具有相同的长度及半径方向中心的多个螺旋形天线，各天线具有连接高频振荡器的输入端及作为与输入端相对的端子连接接地的输出端，在各螺旋形天线的输出端安装平衡电容器，以便在各天线的长度方向中心形成虚拟接地；在多个螺旋形天线中，输入端及输出端相对于半径方向中心以相同角度配置，长度方向中心配置在多个螺旋形天线的输出端之间。 【EN】The plasma processing apparatus of the present invention includes: an induction cavity for introducing a source gas into the interior to generate a plasma; a processing chamber for placing a substrate to be processed by using the plasma generated by the induction chamber; an ICP antenna located outside the induction chamber, forming an induction magnetic field to generate plasma from a source gas introduced into the induction chamber; and a high frequency oscillator for applying radio frequency power to the ICP antenna; the ICP antenna includes a plurality of spiral antennas having the same length and center in the radial direction, each antenna having an input terminal connected to a high-frequency oscillator and an output terminal connected to the ground as a terminal opposite to the input terminal, and a balance capacitor is mounted at the output terminal of each spiral antenna so as to form a virtual ground at the center in the longitudinal direction of each antenna; in the plurality of spiral antennas, the input end and the output end are arranged at the same angle with respect to the center in the radial direction, and the center in the longitudinal direction is arranged between the output ends of the plurality of spiral antennas.